3εFERRO_H2020

Energy Efficient Embedded Non-volatile Memory & Logic based on Ferroelectric Hf(Zr)O2

#ICT #H2020 @EU_H2020

[3εFERRO_H2020 @3eFerro]

🇪🇺 This project has received funding from the European Union’s Horizon 2020 research and innovation programme under grant agreement No 780302

[3εFERRO_H2020 @3eFerro]

Metastable ferroelectricity driven by depolarization fields in ultrathin Hf0.5Zr0.5O2. https://t.co/aigUHwCyWd
#Nature #CommunicationsPhysics #3eFerro #BeFerroSynaptic #HfO2

[3εFERRO_H2020 @3eFerro]

Hf0.5Zr0.5O2-Based Germanium Ferroelectric p-FETs for Nonvolatile Memory Applications #NCSRD #3eFerro #BeFerroSynaptic
https://t.co/YkGH7ba4rk

[AIP Publishing @AIP_Publishing]

In hafnia based microscopic ferroelectric capacitors, synchrotron X-ray photoemission electron microscopy has revealed the formation and evolution of oxygen vacancies as a function of field cycling. @3eFerro #HfO2 #H2020 https://t.co/bI4pvFsy2r

[3εFERRO_H2020 @3eFerro]

https://t.co/m5A0c0kS5Y

[Ian O'Connor @ianoconnor]

Call for Contributions
DATE 2022 Friday Workshop on Ferroelectronics
Virtual Event
Friday March 18th 2022
Submission deadline: Dec. 17th 2021 https://t.co/hfv456TFwd

[3εFERRO_H2020 @3eFerro]

Final and review meetings of the H2020 project 3eFERRO last week at CEA-Leti. The 3eFERRO project finished on June 30th 2021 and the website provides the full publication list. https://t.co/dMnCcLSzj6
#Ferroelectric #IoT #ecofriendlytechnologies #HfO2 #nonvolatilememory #H2020

[3εFERRO_H2020 @3eFerro]

2 year post-doc at CEA to study the control of conductivity in β-Ga2O3 using the ferroelectric polarization of HfZrO2. The work focuses on the electronic structure at the interface using in operando photoelectron spectroscopy. CV to [email protected]
https://t.co/Zt8kljoieI

[3εFERRO_H2020 @3eFerro]

A funded PhD position is open to focus on the characterization and understanding of the chemical and electronic structure of the electrode/BaSrTiO3 interface in tunable capacitors for 5G applications with CEA Saclay, CV to [email protected].
https://t.co/0X5WosqKzx

[3εFERRO_H2020 @3eFerro]

Imprint issue during retention tests for HfO2-based FRAM: An industrial challenge?
https://t.co/yAGnrerUL9

[3εFERRO_H2020 @3eFerro]

NEW: Check out our latest newsletter now available on our website. https://t.co/URqziuxA32

[3εFERRO_H2020 @3eFerro]

NEW: Discover the 3eFERRO project in video!
#Ferroelectric #IoT #ecofriendlytechnologies #HfO2 #FeRAM
https://t.co/zNiPNHpI3S

[3εFERRO_H2020 @3eFerro]

Very proud that our article was the most downloaded (1454 times) in the dielectrics, ferroelectrics and multiferroics section of J. Appl. Phys. in 2020. Hopefully with the efforts of all these groups we’ll see new low power memories soon!
https://t.co/pF8d27dlSh

[3εFERRO_H2020 @3eFerro]

Impact of vacancies and impurities on ferroelectricity in PVD- and ALD-grown HfO2 films.
https://t.co/jSfqmwp3tL

[3εFERRO_H2020 @3eFerro]

A perspective on semiconductor devices based on fluorite-structured ferroelectrics from the materials–device integration perspective
https://t.co/DXee9nAvRT

[3εFERRO_H2020 @3eFerro]

Polarization switching in thin doped HfO2 ferroelectric layers.
https://t.co/mpEj5zRrVQ

[3εFERRO_H2020 @3eFerro]

When gate induced drain leakage becomes the means to make a robust frequency doubling device using ferroelectric HfO2 based FeFET. #FE_HfO2 #FeFET #NatureElectronics

https://t.co/t7spYMESeT

[3εFERRO_H2020 @3eFerro]

Enhanced Ferroelectric Polarization in TiN/HfO2/TiN Capacitors by Interface Design https://t.co/jQUEdtwpxS

[3εFERRO_H2020 @3eFerro]

A comprehensive study of imprint in HZO MFS capacitors limiting reliability of FeFETs. Injection of carriers at the top interface dominate imprint but the clean Ge/HZO bottom interface helps reducing it. This depends on the crystallization annealing method
https://t.co/tgkZi2pvbF

[3εFERRO_H2020 @3eFerro]

Glad to announce that we have just completed accurate #HAXPES analysis on different technologically relevant structures provided by #3eFERRO partners.
Many thanks to synchrotron #Soleil and #GALAXIES beamline. #3eFERRO #FE_hafnia #Synchrotron_Soleil☀️🧐💪✔️

[GlobalFoundries @GlobalFoundries]

GF semiconductors are accelerating the digital future. Learn how our chips are made at: https://t.co/uya5AGOHQV