NineScrolls LLC's primary focus is on establishing a comprehensive platform that connects manufacturers, researchers, and industry professionals across the US.
Congratulations to Ren et al. on a striking result. π¬
If you're working on SiC photonics, metasurfaces, or anything that
demands clean ICP etching of hard dielectrics β we'd love to talk
recipes.
π https://t.co/MUejSCxPoW
#metasurfaces#photonics#SiC#ICPRIE #nanofabrication
π¨ New in @AdvFunctMater: a single-layer SiC metasurface that
independently controls Hue, Saturation, AND Brightness β and
doubles as an optical encryption platform.
A clever piece of photonics, beautifully executed.
π https://t.co/FhnQ9ldrNh
Translation for the photonics community:
β SiC metasurfaces just got a serious manufacturability proof point
β Visible-light HSB encoding opens new directions in nano-printing
and anti-counterfeiting
β The same etch recipe class transfers to SiC photonic ICs and
quantum platforms
ICP vs. RIE for dry etching β when does the upgrade actually pay off?
β RIE: lower cost, simpler, fine for shallow features & AR < 5:1
β ICP: decoupled power = independent control of plasma density & ion energy
If your aspect ratio target is > 5:1 or selectivity needs exceed 20:1, ICP is the right call.
What process are you running? #PlasmaEtching #ICP #RIE #semiconductor #NineScrolls
New in Scientific Reports: ICP etching of single-crystal diamond achieves 1:46 selectivity over Al mask β and it's RF/ICP power, not Oβ/Ar ratio or chamber pressure, that dominates surface roughness.
Experiments performed on the ICP-S-150 system we represent in the U.S.
Paper β https://t.co/vl5LAeKj7T
#ICP #PlasmaEtching #diamond #NineScrolls
From substrates to equipment to exhaust treatment β Beijing Nano-Promiso is your full-spectrum compound semiconductor partner. See what we showcased at SEMICON China 2026. #SEMICONChina#SemiconductorSupplyChain
Just wrapped up an incredible SEMICON China 2026 in Shanghai! Great conversations at Booth E7366 about GaN substrates, process equipment, and our SEMI S2-certified scrubber systems. Thank you to all who visited! #SEMICONChina#Semiconductors#GaN
SEMI S2-certified scrubber systems for semiconductor fabs and research facilities. Safe exhaust gas treatment, built for your process. Learn more at https://t.co/1XKxCTRtcb #FabSafety#SEMIS2#Scrubber
Did you know our ALD system achieves Β±1% uniformity for AlβOβ films?
With a box-in-box chamber design and configurable gas feed-in, it's built for precision at the atomic scale.
Growth materials: AlβOβ, HfOβ, SiOβ, TiOβ, GaβOβ, ZnO, TiN, TaN, SiNx, AlN, GaN, Pt, Pd, W, and more.
Wafer sizes: 4" to 12" β or even larger custom configurations.
Ideal for gate dielectrics, passivation layers, optical coatings, and energy device research.
Learn more β https://t.co/jv7ipKk3z6
#ALD #AtomicLayerDeposition #ThinFilm #Semiconductor #NanoFab
RIE vs ICP β what's the difference and when should you use each?
If you're setting up a dry etching process for your research, choosing between these two matters more than you might think.
Quick breakdown π§΅β
Rule of thumb:
β’ Need straightforward etching with a compact tool? β RIE
β’ Need deep trenches, high selectivity, or delicate materials? β ICP
Both support Si, SiOβ, SiNx, III-V, 2D materials, and metals.
Questions? We're happy to help with process selection β [email protected]
#PlasmaEtching #RIE #ICP #SemiconductorProcessing #NanoFab
ICP (Inductively Coupled Plasma)
β’ Separate ICP source (up to 3000W) + bias RF β independent control of plasma density and ion energy
β’ Higher plasma density β faster etch rates and better anisotropy
β’ Great for: deep Si etching, high-aspect-ratio features, III-V compounds, diamond
β’ Low-damage option for sensitive 2D materials
DOE just committed $179M to three new Microelectronics Science Research Centers β including plasma-based processing research at Princeton.
When national labs double down on plasma science for semiconductor applications, it validates what we see every day: the physics of etching and deposition at the nanoscale is far from "solved." There's enormous room for innovation.
Exciting times for the research community.
#DOE #Microelectronics #PlasmaScience #SemiconductorResearch #ALD #RIE