@lithos_graphein The dimensions here aren't impressive. It's what beam current they're using. With the Zeiss nanofab the max fov was 500 ฮผm x 500ฮผm. And beam current was rarely above 10s pA. I just don't see how this scales.
@NickParkerPrint@FutureJurvetson@dch_nl@farzyness The bottom right image on the first tweet suggests mask, but with gas field ionisation you get a highly collimated beam. So a mask doesn't make sense.
@NickParkerPrint@FutureJurvetson@dch_nl@farzyness And the beam current will be very low ~pA. I would be interested to know what is being patterned is it resist and then pattern transferred into the active material
@NickParkerPrint@FutureJurvetson@dch_nl@farzyness From the schematic and the asterisk above the He it is a gas field ion source. This will give high resolution because you need very high fields to ionize helium. However, ionisation will only take place at the single atom (likely of a 3 atom or trimer configuration).
@PhysicsSteve I always find h index quite interesting. Like, lowest h index of Nobel Prize winner. Lowest h index age rated (h index matching ones age). Worst citations per h index. There's a lot!