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HeatherKorff's profile image
Heather Korff @HeatherKorff
Looks like we have a plentiful Plenary Session at ALD/ALE 2026. Hope you are catching the talks taking place place to start your morning! #ALDALE 2026 @AVS_Members
HeatherKorff's tweet photo. Looks like we have a plentiful Plenary Session at ALD/ALE 2026. Hope you are catching the talks taking place place to start your morning! #ALDALE 2026 @AVS_Members https://t.co/uaWILTPWKi
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AvsAld's profile image
AVSALD @AvsAld
Join us for #ALDALE 2026 in Tampa, Florida from June 28-July 1! #ALDep #ALEtch. Watch for more updates this fall. https://t.co/aNbaot89ct https://t.co/Vwpe4wSFfj
AvsAld's tweet photo. Join us for #ALDALE 2026 in Tampa, Florida from June 28-July 1! #ALDep #ALEtch. Watch for more updates this fall. https://t.co/aNbaot89ct https://t.co/Vwpe4wSFfj https://t.co/sZ0T6R9iFj
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TokyoElectron_J's profile image
東京エレクトロン @TokyoElectron_J
ALD Outstanding Presentation Awardを受賞🏆 東京エレクトロン テクノロジーソリューションズの劉、大越、村上、戸根川のチームが、半導体デバイスの微細化に必要不可欠な技術である、原子層堆積法(ALD)と原子層エッチング法(ALE)に関する国際学会 #ALDALE 2025 にてALD Outstanding Presentation Awardを受賞しました✨ 本賞は、数百件におよぶ発表およびポスターの中から1件のみ表彰される貴重な賞です。ぜひこの場を借りてみなさんとお祝いしたいと思います👏👏👏 300mmウェーハや複雑なナノ構造体への応用が期待される成膜技術「AS-ALD （Area Selective Atomic Layer Deposition：エリア選択的原子層堆積）」技術を用いたSiNの選択成膜プロセスを開発しました。パターン化された基板や高アスペクト比構造（AR>70）への堆積プロセスを簡素化し、630℃という高温環境下でもSiO2の表面を選択的に阻害し、成膜の高い選択性と均一性を実現する革新的な成膜技術として、DRAMや3D NANDなど次世代半導体製造の発展に大きく貢献する成果です。 TELのエンジニアのさらなる活躍にぜひご期待ください！💪💪💪 #TeamTEL #半導体 #ALD #東京エレクトロン #東京エレクトロンテクノロジーソリューションズ #TEL #TechnologyEnablingLife ◆アブストラクト：https://t.co/FbyNVM0mX6
TokyoElectron_J's tweet photo. ALD Outstanding Presentation Awardを受賞🏆 東京エレクトロン テクノロジーソリューションズの劉、大越、村上、戸根川のチームが、半導体デバイスの微細化に必要不可欠な技術である、原子層堆積法(ALD)と原子層エッチング法(ALE)に関する国際学会 #ALDALE 2025 にてALD Outstanding Presentation Awardを受賞しました✨ 本賞は、数百件におよぶ発表およびポスターの中から1件のみ表彰される貴重な賞です。ぜひこの場を借りてみなさんとお祝いしたいと思います👏👏👏 300mmウェーハや複雑なナノ構造体への応用が期待される成膜技術「AS-ALD （Area Selective Atomic Layer Deposition：エリア選択的原子層堆積）」技術を用いたSiNの選択成膜プロセスを開発しました。パターン化された基板や高アスペクト比構造（AR>70）への堆積プロセスを簡素化し、630℃という高温環境下でもSiO2の表面を選択的に阻害し、成膜の高い選択性と均一性を実現する革新的な成膜技術として、DRAMや3D NANDなど次世代半導体製造の発展に大きく貢献する成果です。 TELのエンジニアのさらなる活躍にぜひご期待ください！💪💪💪 #TeamTEL #半導体 #ALD #東京エレクトロン #東京エレクトロンテクノロジーソリューションズ #TEL #TechnologyEnablingLife ◆アブストラクト：https://t.co/FbyNVM0mX6
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BentGroup's profile image
Bent Group @BentGroup
Prof. Stacey Bent presenting at the tutorial session this afternoon at #ALDALE conference!
BentGroup's tweet photo. Prof. Stacey Bent presenting at the tutorial session this afternoon at #ALDALE conference! https://t.co/tUAgRaBAqX
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ErwinKessels's profile image
Erwin Kessels @ErwinKessels
The Plasma & Materials Processing group (current members & alumni) of the @TUeindhoven at #ALDALE in Bellevue Washington
ErwinKessels's tweet photo. The Plasma & Materials Processing group (current members & alumni) of the @TUeindhoven at #ALDALE in Bellevue Washington https://t.co/3gEubJ1zWr
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AVS_Members's profile image
AVS Verified account @AVS_Members
The #ALDALE technical program is now online for the July meeting in Bellevue, Washington. Have research you would still like to present? The late news call for abstracts deadline is May 5, 2023. #ALDep #ALEtch @AVSALD https://t.co/qrWj3ZpKtJ
AVS_Members's tweet photo. The #ALDALE technical program is now online for the July meeting in Bellevue, Washington. Have research you would still like to present? The late news call for abstracts deadline is May 5, 2023. #ALDep #ALEtch @AVSALD https://t.co/qrWj3ZpKtJ https://t.co/FkNucU8xof
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AVS_Members's profile image
AVS Verified account @AVS_Members
#ALDALE 2023 Call for Abstracts Due Feb. 15, 2023. Join us July 23-26, 2023 in Bellevue, Washington for a three-day meeting on the science and technology of atomic layer controlled deposition of thin films and atomic layer etching #ALDep #ALEtch @AVSALD https://t.co/C7O0PRUGWV
AVS_Members's tweet photo. #ALDALE 2023 Call for Abstracts Due Feb. 15, 2023. Join us July 23-26, 2023 in Bellevue, Washington for a three-day meeting on the science and technology of atomic layer controlled deposition of thin films and atomic layer etching #ALDep #ALEtch @AVSALD https://t.co/C7O0PRUGWV https://t.co/zQS5qpuxNL
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AvsAld's profile image
AVSALD @AvsAld
Don’t forget to submit your #ALDALE 2022 manuscript to the AVS Journal of Vacuum Science & Technology A ALD/ALE Special Issue (https://t.co/CHGnTuJF3V) by November 1, 2022. @JVSTA @AVSALD @AVS_Members #ALDep #ALEtch
AvsAld's tweet photo. Don’t forget to submit your #ALDALE 2022 manuscript to the AVS Journal of Vacuum Science & Technology A ALD/ALE Special Issue (https://t.co/CHGnTuJF3V) by November 1, 2022. @JVSTA @AVSALD @AVS_Members #ALDep #ALEtch https://t.co/4s62GebrGS
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JVSTAB's profile image
JVST A - JVST B @JVSTAB
Don’t forget to submit your #ALDALE 2022 manuscript to the AVS Journal of Vacuum Science & Technology A ALD/ALE Special Issue (https://t.co/AVm5ooiGYz) by November 1, 2022. @JVSTA @AVSALD @AVS_Members #ALDep #ALEtch
JVSTAB's tweet photo. Don’t forget to submit your #ALDALE 2022 manuscript to the AVS Journal of Vacuum Science & Technology A ALD/ALE Special Issue (https://t.co/AVm5ooiGYz) by November 1, 2022. @JVSTA @AVSALD @AVS_Members #ALDep #ALEtch https://t.co/NY0m6SJXQr
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PaskalPamburayi's profile image
Pamburayi Mpofu @PaskalPamburayi
Back again with another opportunity to present a poster on our #ALDep work at the #ALDALE2022 in Ghent, Belgium. Most importantly it’s my first ever ALD conference. So much looking forward to meet the #ALDALE community. And of course having a taste of the famous Belgien beers! 😅
PaskalPamburayi's tweet photo. Back again with another opportunity to present a poster on our #ALDep work at the #ALDALE2022 in Ghent, Belgium. Most importantly it’s my first ever ALD conference. So much looking forward to meet the #ALDALE community. And of course having a taste of the famous Belgien beers! 😅 https://t.co/m0rH5dD1Yb
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kirti_sankhala's profile image
Kirti Sankhala @kirti_sankhala
· Israel
On my way to #ALDALE2022, #Ghent, #Belgium. My first ever #ALD conference, looking forward to meet #ALDALE community 🤩 I will present my research about ‘Potential of ALD in membrane technology’, on Wednesday, 29th, in the session ‘hybrid coatings’,
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ycmhrv's profile image
تحالف رصد Rasd Coalition Verified account @ycmhrv
🚨 #Houthis targeted #Marib with 2 ballistic missiles since morning as they mobilize toward the south & west frontlines. Rasd Coalition has documented many breaks to the truce in many frontlines in #Yemen cities, #Houdaida, #WestCost, #Taiz, & #AlDale. @Alsakaniali @OSE_Yemen
ycmhrv's profile image
تحالف رصد Rasd Coalition Verified account @ycmhrv
#Houthis continue mobilization on #Marib fronts, While The #Yemeni & international community call on all conflicting parties to adhere to the truce called by the @OSE_Yemen. Many breaks to the truce were reported, & this morning #Houthis fired a missile at #Marib, No casualties.
ycmhrv's tweet photo. #Houthis continue mobilization on #Marib fronts, While The #Yemeni & international community call on all conflicting parties to adhere to the truce called by the @OSE_Yemen. Many breaks to the truce were reported, & this morning #Houthis fired a missile at #Marib, No casualties. https://t.co/NN8saiGTXI
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AVS_Members's profile image
AVS Verified account @AVS_Members
The #ALDALE 2022 Technical Program is now online. Do you have late breaking news you would still like to present? It's not too late--submit your abstract by April 6 https://t.co/JdYlIbLgR7 @AVSALD #ALDep #ALEtch
AVS_Members's tweet photo. The #ALDALE 2022 Technical Program is now online. Do you have late breaking news you would still like to present? It's not too late--submit your abstract by April 6 https://t.co/JdYlIbLgR7 @AVSALD #ALDep #ALEtch https://t.co/qIUeqJXtdI
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AVS_Members's profile image
AVS Verified account @AVS_Members
SAVE THE DATE for ALD/ALE 2022 - June 26-29, 2022, Ghent, Belgium https://t.co/4ZNdkRCFjE #ALDALE 2022 @AVSALD https://t.co/FMlVqX79D3
AVS_Members's tweet photo. SAVE THE DATE for ALD/ALE 2022 - June 26-29, 2022, Ghent, Belgium https://t.co/4ZNdkRCFjE #ALDALE 2022 @AVSALD https://t.co/FMlVqX79D3 https://t.co/D9EZnap79v
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AVS_Members's profile image
AVS Verified account @AVS_Members
Register for #ALDALE 2021 featuring 90 Live Presentations and 220+ On Demand. Plus a One-Day Tutorial. @AVSALD #ALDep #ALEtch https://t.co/UP25bRB93o
AVS_Members's tweet photo. Register for #ALDALE 2021 featuring 90 Live Presentations and 220+ On Demand. Plus a One-Day Tutorial. @AVSALD #ALDep #ALEtch https://t.co/UP25bRB93o https://t.co/rhB3hPrclY
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AvsAld's profile image
AVSALD @AvsAld
Make plans now to prepare and submit your #ALDALE 2021 abstract by Feb. 3, 2021 #ALDep #ALEtch @AVSALD https://t.co/cEcWr1H2fT
AVS_Members's profile image
AVS Verified account @AVS_Members
Make plans now to prepare and submit your #ALDALE 2021 abstract by Feb. 3, 2021 #ALDep #ALEtch @AVSALD https://t.co/boXhdRxDjP
AVS_Members's tweet photo. Make plans now to prepare and submit your #ALDALE 2021 abstract by Feb. 3, 2021 #ALDep #ALEtch @AVSALD https://t.co/boXhdRxDjP https://t.co/vLStc99CkJ
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Merck_Elec's profile image
Merck Electronics @Merck_Elec
Advancing #semiconductors and accelerating the next generation of deposition materials. Visit our #ALD2020 conference page and e-meet us in one of our virtual sessions! https://t.co/R2Kjq5Emeq #AdvancingSemiconductors #aldale
Merck_Elec's tweet photo. Advancing #semiconductors and accelerating the next generation of deposition materials. Visit our #ALD2020 conference page and e-meet us in one of our virtual sessions! https://t.co/R2Kjq5Emeq #AdvancingSemiconductors #aldale https://t.co/XY9HDZFHxi
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AVS_Members's profile image
AVS Verified account @AVS_Members
#ALDALE 2020 Abstracts are due TODAY #ALDep #ALEtch @AVSALD https://t.co/WFi10arYUt
AVS_Members's tweet photo. #ALDALE 2020 Abstracts are due TODAY #ALDep #ALEtch @AVSALD https://t.co/WFi10arYUt https://t.co/Zxp3aVyqt4
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AVS_Members's profile image
AVS Verified account @AVS_Members
#ALDALE 2020 Abstracts are due this coming Monday, Feb. 3, 2020 #ALDep #ALEtch https://t.co/6aPjHVPC8a
AVS_Members's tweet photo. #ALDALE 2020 Abstracts are due this coming Monday, Feb. 3, 2020 #ALDep #ALEtch https://t.co/6aPjHVPC8a https://t.co/zLyH5BgfKD
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Mick__geek's profile image
Michael Nolan @Mick__geek
@hacp81 Agreed, was a really great conference particularly as it was my first #ALDALE Was great to see you again. Safe travel home
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