Top Tweets for #TestedWithPillarHall
We are still in October 2024, but we published a paper already in 2025!
Happy to see this one published: Emara et al., "Lanthanum doped hafnium oxide thin films deposited on a lateral high aspect ratio structure..." https://t.co/hLKoeuPcTk
#TestedWithPillarHall #ALDep
Wafer level conformality of ALD processes, ultra-fast, accurately and industry compatibly. First demo results presented by Chipmetrics Head of Wafer Business, Thomas Werner in #ALD4INDUSTRY #ALDep #TestedWithPillarHall
Slides of my invited talk at #AVS69 on recent progress (and of course some historical perspective π) on #ALDep #ALDconformality analysis are to view in SlideShare: https://t.co/XFv0HZklYv . #PillarHall #TestedWithPillarHall @chipmetrics
Amazing! PillarHall is used to develop CONFORMAL Plasma-enhanced Spatial ALD process in atmospheric pressure!
This will pave the way for new application opportunities. Remarkable results!
#TestedWithPillarHall #ALDep
Did you know atmospheric-pressure plasma-enhanced spatial #ALDep can be used to deposit highly conformal films? In this letter we show this for SiO2 and TiO2, determine the radical recombination probability, and draw comparisons with low-pressure PE-ALD. https://t.co/lMbUJEuOT9
Hox! Novel ozone generator developed specially for conformal thin films to meet extreme high aspect ratio challenges. #TestedWithPillarHall. Great work by Meiden Nanoprocess Innovations, Soichiro Motoda and the team. Congrats!
#ALDALE2023 #PillarHall
In Chipmetrics, we are proud to support intelligent students such as @Mike_vandePoll He has carried groundbreaking Spatial ALD conformality research. Thumbs up for the student award, indeed!
#TestedWithPillarHall
#ALDALE2023
The ALD 2023 Student Finalists have been announced. They will present their research Monday afternoon, July 24, 2023, during #ALDALE2023 in Bellevue, Washington. Learn more at https://t.co/KYHKzjwOB2 #ALDep @AVS_Members
Wow! Just passing by π
Chipmetrics, Joensuu
#TestedWithPillarHall
#PillarHall - now I run into the image I have been looking for so long π
β #TestedWithPillarHall β
Do you have challenges in chacterization of thin films in 3D high aspect ratio structures? Do you know your thin film conformality? Visit Chipmetrics booth and find the solution #ALDALE2022 #ALDep #PillarHall #TestedWithPillarHall
#ALDALE2021 conference starts virtually in 27th June. Our CEO @MikkoUtriainen is presenting how to characterize thin film conformality in a wafer scale. The novel method is sensitive way to accelerate 3D thin film process development.
#TestedWithPillarHall #ALDep
Conformality data is available in a new public data sharing platform. #TestedWithPillarHall
Fascinating practical step to real open access academic research. We wish success to @rlpuu and @ltoili with the initiative.
News! My (& @ltoili's) 1st-ever public dataset is available at https://t.co/Ym63vt33EB.
Related to PCCP "saturation profile paper" https://t.co/J8F0BC3VJ5. We anticipated that we would make data available via https://t.co/4EYHkImvVX, https://t.co/WblIxqscZe. Now finally done!
News! My (& @ltoili's) 1st-ever public dataset is available at https://t.co/Ym63vt33EB.
Related to PCCP "saturation profile paper" https://t.co/J8F0BC3VJ5. We anticipated that we would make data available via https://t.co/4EYHkImvVX, https://t.co/WblIxqscZe. Now finally done!
These TEMs look so great that they could very well become the basis of a logo of ALD for somewhere! Great paper, & happy to be part of it. #PillarHall #TestedWithPillarHall (no PillarHall in the pic though)
@CVD_ALD_papers @ArtsKarsten Very happy that we have these cool TEMs now published. Besides all the other insights in the paper it also show visually the conformal capabilities of plasma ALD TiO2, SiO2 and Al2O3. #ALDep #Plasma
Did you know that plasma #ALDep of SiO2 and TiO2 can be very conformal! #TestedWithPillarHall research article by @ArtsKarsten and colleagues.
https://t.co/ISyQafJs2Y
How conformal is spatial-ALD ? It will be #TestedWithPillarHall in the new research project lead by @TUeindhoven #ALDep
https://t.co/0eCmlGUxPu
Chipmetrics is opening new opportunities in the development of semiconductors, memory circuits and smart devices by launching to market a test chip for analysing 3D thin-film structures. https://t.co/JtSgUOlopt @VTTFinland #Chipmetrics #Finland #semiconductor #goodnewsfromfinland
So soon online! Yim, Ylivaara, et al., "Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels", PCCP, https://t.co/J8F0BC3VJ5. #ALDep #ALDconformality #SaturationProfile #TMAwater #TestedWithPillarHall
New paper in Appl Phys Lett: Arts et al. "Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate", https://t.co/rtq7t3dcXb. Grateful for the collaboration! @ArtsKarsten @ErwinKessels @HarmKnoops
On our Materials Matter blog, read about how weβve developed a simpler screening method for looking at the properties of films deposited into high aspect-ratio structures: https://t.co/bow6lZtlMn @VTTFinland #TestedWithPillarHall #ALDep #DigiLiving @EMDGroup @VersumMaterials
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