Nice article on microphotolithography history & future by Chip Miller, author of “Chip War.” Published on June 23, 2023, my Father’s 100th birthday! https://t.co/i3cAprZ95v
This is an amazing opportunity for someone to play a huge role in shaping the future of advanced semiconductor patterning. Join us at Geminatio! https://t.co/vnjR8qGouS
Long story but worth the time. A lot about the technology and people I worked most closely with over the last three decades. It’s shorter than reading “Chip War” and more personal as it focuses attention on two friends who I worke…https://t.co/awgYAGQHIf https://t.co/8rDEsdX2SP
After Davos, Pat Gelsinger visits IMS Nanofabrication in Vienna - says IMS is almost the exclusive maker of EUV mask [writers.] https://t.co/3y0yCfGvKx
In case you missed it - 2022 SPIE Kingslake Award to Shibuya-san for invention of a phase-shifting photo mask at Nikon and innovative work across optical design and imaging theory.
(This technological breakthrough was published in…https://t.co/MgjC23uyKz https://t.co/OmMvV7tdG0
The 2022 BACUS Prize is well deserved! Many individuals were vital the the success of #ASML's #EUV pellicle - too many to list! Proud to have worked with this amazing team from 2011 to 2018. https://t.co/tIBWMEaeAh
R&D incentives may in the long run prove the most important part of the CHIPS Act: leaps in chip technology are often boosted by government research grants. For those seeking to understand more, Chris Miller’s new book “CHIP WAR” is a fine place to start. https://t.co/oHnX978M0v
October 9 (10-9) is National Nanotechnology Day—the day that celebrates the potency of the world at the scale of one nanometer, 10-9 or one billionth of a meter. https://t.co/JG4JBzs4u4
Excellent 53 minute video documentary about #ASML#EUV with narration in English and English subtitles.
"ASML makes the most advanced machine in the world; the lithography machine to make computer chips. And with chips as a strate…https://t.co/yu2KeR2xWH https://t.co/ID7iNYFI33
Martin’s questioning the economics of and need for hyper-NA EUV will spur interesting discussions at SPIE EUV Symposium & Photomask (BACUS) in Monterey October 26-29, 2022. See you there? https://t.co/bk4wBhg90f
No travel costs or jet lag to participate this year in Photomask Japan Symposium on Photomask and NGL Mask Technology. Early registration deadline April 12th. Presentations and Q&A will be available in real time and recorded for l…https://t.co/XXnSo1Chn5 https://t.co/Lnw3wTzacB