NineScrolls

NineScrolls LLC's primary focus is on establishing a comprehensive platform that connects manufacturers, researchers, and industry professionals across the US.

[NineScrolls @NineScrolls]

Congratulations to Ren et al. on a striking result. 🔬

If you're working on SiC photonics, metasurfaces, or anything that
demands clean ICP etching of hard dielectrics — we'd love to talk
recipes.

🔗 https://t.co/MUejSCxPoW

#metasurfaces #photonics #SiC #ICPRIE #nanofabrication

[NineScrolls @NineScrolls]

🎨 New in @AdvFunctMater: a single-layer SiC metasurface that
independently controls Hue, Saturation, AND Brightness — and
doubles as an optical encryption platform.

A clever piece of photonics, beautifully executed.

📄 https://t.co/FhnQ9ldrNh

[NineScrolls @NineScrolls]

Translation for the photonics community:

✅ SiC metasurfaces just got a serious manufacturability proof point
✅ Visible-light HSB encoding opens new directions in nano-printing
and anti-counterfeiting
✅ The same etch recipe class transfers to SiC photonic ICs and
quantum platforms

[NineScrolls @NineScrolls]

@zhcui0408 Congratulations!

[NineScrolls @NineScrolls]

ICP vs. RIE for dry etching — when does the upgrade actually pay off?

→ RIE: lower cost, simpler, fine for shallow features & AR < 5:1
→ ICP: decoupled power = independent control of plasma density & ion energy

If your aspect ratio target is > 5:1 or selectivity needs exceed 20:1, ICP is the right call.

What process are you running? #PlasmaEtching #ICP #RIE #semiconductor #NineScrolls

[NineScrolls @NineScrolls]

New in Scientific Reports: ICP etching of single-crystal diamond achieves 1:46 selectivity over Al mask — and it's RF/ICP power, not O₂/Ar ratio or chamber pressure, that dominates surface roughness.
Experiments performed on the ICP-S-150 system we represent in the U.S.
Paper → https://t.co/vl5LAeKj7T
#ICP #PlasmaEtching #diamond #NineScrolls

[NineScrolls @NineScrolls]

From substrates to equipment to exhaust treatment — Beijing Nano-Promiso is your full-spectrum compound semiconductor partner. See what we showcased at SEMICON China 2026. #SEMICONChina #SemiconductorSupplyChain

[NineScrolls @NineScrolls]

Just wrapped up an incredible SEMICON China 2026 in Shanghai! Great conversations at Booth E7366 about GaN substrates, process equipment, and our SEMI S2-certified scrubber systems. Thank you to all who visited! #SEMICONChina #Semiconductors #GaN

[NineScrolls @NineScrolls]

SEMI S2-certified scrubber systems for semiconductor fabs and research facilities. Safe exhaust gas treatment, built for your process. Learn more at https://t.co/1XKxCTRtcb #FabSafety #SEMIS2 #Scrubber

[NineScrolls @NineScrolls]

@StimulatedRaman @UCSD @UCSDHealth @ucsdbiosciences @UCSDnews @SallyRideSci @UCSDGiving @ucsdbe @UCSDJacobs @Yajuan_02 Congratulations!👏

[NineScrolls @NineScrolls]

Did you know our ALD system achieves ±1% uniformity for Al₂O₃ films?

With a box-in-box chamber design and configurable gas feed-in, it's built for precision at the atomic scale.

Growth materials: Al₂O₃, HfO₂, SiO₂, TiO₂, Ga₂O₃, ZnO, TiN, TaN, SiNx, AlN, GaN, Pt, Pd, W, and more.

Wafer sizes: 4" to 12" — or even larger custom configurations.

Ideal for gate dielectrics, passivation layers, optical coatings, and energy device research.

Learn more → https://t.co/jv7ipKk3z6

#ALD #AtomicLayerDeposition #ThinFilm #Semiconductor #NanoFab

[NineScrolls @NineScrolls]

Full guide with process data and equipment specs: https://t.co/dXNKmPzi5d

[NineScrolls @NineScrolls]

RIE vs ICP — what's the difference and when should you use each?

If you're setting up a dry etching process for your research, choosing between these two matters more than you might think.

Quick breakdown 🧵↓

[NineScrolls @NineScrolls]

Rule of thumb:
• Need straightforward etching with a compact tool? → RIE
• Need deep trenches, high selectivity, or delicate materials? → ICP

Both support Si, SiO₂, SiNx, III-V, 2D materials, and metals.

Questions? We're happy to help with process selection → [email protected]

#PlasmaEtching #RIE #ICP #SemiconductorProcessing #NanoFab

[NineScrolls @NineScrolls]

ICP (Inductively Coupled Plasma)
• Separate ICP source (up to 3000W) + bias RF — independent control of plasma density and ion energy
• Higher plasma density → faster etch rates and better anisotropy
• Great for: deep Si etching, high-aspect-ratio features, III-V compounds, diamond
• Low-damage option for sensitive 2D materials

[NineScrolls @NineScrolls]

DOE just committed $179M to three new Microelectronics Science Research Centers — including plasma-based processing research at Princeton.

When national labs double down on plasma science for semiconductor applications, it validates what we see every day: the physics of etching and deposition at the nanoscale is far from "solved." There's enormous room for innovation.

Exciting times for the research community.

#DOE #Microelectronics #PlasmaScience #SemiconductorResearch #ALD #RIE