![Object_Zero_'s tweet photo. High NA-EUV Lithography
Zeiss is beginning production of their High NA-EUV systems for ASML.
“High NA” means high numerical aperture, which is a measure of the angular range from which an optical system can pick up light. For context High NA has numerical aperture of 0.55, whereas current EUV NA is 0.33
A 66% improvement.
That’s a feature density improvement of 1.67^2=2.789 so a near tripling of transistor density per unit area. It brings the critical dimension down to 8nm from 13nm.
Q: How did Zeiss achieve this?
A: With great difficulty.
• The projection optics system is 40,000 parts and around 12 tonnes.
• The illumination system is 25,000 parts and is 6 tonnes.
• The machine that manufacturers these mirrors is based in Germany, and consists of 100,000 parts and is 150 tonnes, the machining chamber itself is a 5m x 5m x 10m vacuum chamber.
The mirrors are machined for 3 months[!] to achieve a precision equivalent to 1mm deviation over an area the size of the Pacific Ocean.
It’s worth noting here that theoretical maximum NA = 1.0
Hyper NA (>0.7 and achieved using 8 mirrors) is expected the enter production 2032 - 2035.
That brings the critical dimension down to around 6nm and that might be the end, a single silicon atom is 0.23nm so the precision would be +/- 24 atoms.
Fun note… there is a category of lathes and machine tools called “ultra-precision” and these have axis resolutions of 1-2nm and can produce contoured shapes to 25nm accuracy.
You can buy “ultra-precision” machines, grinding machines for optical equipment have incredibly precise axis control because surface asperity on a mirror is visible to the eye.
B23B is the IPC/CPC class, and it teaches some interesting niche stuff (tells you where the future is going, even with trade secrets omitted).](https://pbs.twimg.com/media/HOjSHHaXEAATD6f.jpg)
![Object_Zero_'s tweet photo. High NA-EUV Lithography
Zeiss is beginning production of their High NA-EUV systems for ASML.
“High NA” means high numerical aperture, which is a measure of the angular range from which an optical system can pick up light. For context High NA has numerical aperture of 0.55, whereas current EUV NA is 0.33
A 66% improvement.
That’s a feature density improvement of 1.67^2=2.789 so a near tripling of transistor density per unit area. It brings the critical dimension down to 8nm from 13nm.
Q: How did Zeiss achieve this?
A: With great difficulty.
• The projection optics system is 40,000 parts and around 12 tonnes.
• The illumination system is 25,000 parts and is 6 tonnes.
• The machine that manufacturers these mirrors is based in Germany, and consists of 100,000 parts and is 150 tonnes, the machining chamber itself is a 5m x 5m x 10m vacuum chamber.
The mirrors are machined for 3 months[!] to achieve a precision equivalent to 1mm deviation over an area the size of the Pacific Ocean.
It’s worth noting here that theoretical maximum NA = 1.0
Hyper NA (>0.7 and achieved using 8 mirrors) is expected the enter production 2032 - 2035.
That brings the critical dimension down to around 6nm and that might be the end, a single silicon atom is 0.23nm so the precision would be +/- 24 atoms.
Fun note… there is a category of lathes and machine tools called “ultra-precision” and these have axis resolutions of 1-2nm and can produce contoured shapes to 25nm accuracy.
You can buy “ultra-precision” machines, grinding machines for optical equipment have incredibly precise axis control because surface asperity on a mirror is visible to the eye.
B23B is the IPC/CPC class, and it teaches some interesting niche stuff (tells you where the future is going, even with trade secrets omitted).](https://pbs.twimg.com/media/HOjSHHWX0AAf0ek.jpg)
![Object_Zero_'s tweet photo. High NA-EUV Lithography
Zeiss is beginning production of their High NA-EUV systems for ASML.
“High NA” means high numerical aperture, which is a measure of the angular range from which an optical system can pick up light. For context High NA has numerical aperture of 0.55, whereas current EUV NA is 0.33
A 66% improvement.
That’s a feature density improvement of 1.67^2=2.789 so a near tripling of transistor density per unit area. It brings the critical dimension down to 8nm from 13nm.
Q: How did Zeiss achieve this?
A: With great difficulty.
• The projection optics system is 40,000 parts and around 12 tonnes.
• The illumination system is 25,000 parts and is 6 tonnes.
• The machine that manufacturers these mirrors is based in Germany, and consists of 100,000 parts and is 150 tonnes, the machining chamber itself is a 5m x 5m x 10m vacuum chamber.
The mirrors are machined for 3 months[!] to achieve a precision equivalent to 1mm deviation over an area the size of the Pacific Ocean.
It’s worth noting here that theoretical maximum NA = 1.0
Hyper NA (>0.7 and achieved using 8 mirrors) is expected the enter production 2032 - 2035.
That brings the critical dimension down to around 6nm and that might be the end, a single silicon atom is 0.23nm so the precision would be +/- 24 atoms.
Fun note… there is a category of lathes and machine tools called “ultra-precision” and these have axis resolutions of 1-2nm and can produce contoured shapes to 25nm accuracy.
You can buy “ultra-precision” machines, grinding machines for optical equipment have incredibly precise axis control because surface asperity on a mirror is visible to the eye.
B23B is the IPC/CPC class, and it teaches some interesting niche stuff (tells you where the future is going, even with trade secrets omitted).](https://pbs.twimg.com/media/HOjSHHVWwAAdfjb.jpg)
Olivia
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@TailThatWagsDog looks like you called todays bullishness here yesterday!
@TailThatWagsDog happy to chat to find out if we can share ideas!
@TailThatWagsDog My version is spx gex change, I use optionsdepth api and also massive nyse moc data:
This Github repo contains 500 AI Agents Projects across various industries like healthcare, finance, education, retail.
It showcases practical applications and provides links to open-source projects for implementation, illustrating AI agents
https://t.co/wpxDSIkxvQ
Good internships teach you new skills to grow in your career. Great internships help you do that AND teach you how to drive off-road! This summer, some @Ford interns got to hit the trails at our Michigan proving grounds to learn from our off-roading experts. Hope they get to use these new skills on many future adventures! https://t.co/J5OWaC0XOB
Imagine the perfect end run around the cellular carriers.
Every Tesla Cybercab contains a specialized Starlink terminal that not only provides broadband connectivity for the vehicle, but also functions as a femtocell— a miniature cellular base station serving nearby phones.
Starlink supplies the backhaul for both voice and data, eliminating the need for expensive fiber-fed terrestrial infrastructure.
SpaceX has already described the femtocell model as one approach to expanding mobile coverage. Instead of relying solely on large, costly cell towers, connectivity can be distributed across thousands— or eventually millions— of small access points.
SpaceX has also said these femtocell capabilities would be integrated into the same hardware that hosts Starlink user terminals. Tesla's Cybercab just so happens to integrate Starlink, making it an intriguing platform for exactly this kind of distributed network.
The scale of what Elon is building in Bastrop is not well understood.
Today, we’re launching Alpamayo 2 Super, our frontier open reasoning model for autonomous vehicles.
Beyond seeing, Alpamayo understands and reasons through the complex world - thinks before it acts.
It’s a powerful backbone for robotaxis, trucks, shuttles, delivery vans, tractors and the long tail of mobile robots—billions of autonomous machines someday.
We’re releasing it for commercial use under OpenMDW-1.1 so teams can inspect it, fine-tune it and deploy it—open models advance safety and security.
The next wave of AI is robotics—and it starts with autonomous vehicles.
Great work, Alpamayo team!
https://t.co/2PYCCXWjZh
1/ $SPX price action is driven by more than charts and headlines.
A major force behind short-term moves is dealer hedging around options positioning and that's where Gamma Exposure (GEX) comes in.
BREAKING: NASA has revealed new details about wind-tunnel testing of SpaceX’s Super Heavy Version 3 booster, which will launch Starship HLS for future Artemis missions.
A 1.2% scale model was tested at NASA Ames at speeds ranging from Mach 0.2 to Mach 2.5. The tests measured aerodynamic forces, buffeting and vibrations during re-entry to improve flight guidance and structural-load analysis.
Couple car seats in the second row of the Model Y L:
High NA-EUV Lithography
Zeiss is beginning production of their High NA-EUV systems for ASML.
“High NA” means high numerical aperture, which is a measure of the angular range from which an optical system can pick up light. For context High NA has numerical aperture of 0.55, whereas current EUV NA is 0.33
A 66% improvement.
That’s a feature density improvement of 1.67^2=2.789 so a near tripling of transistor density per unit area. It brings the critical dimension down to 8nm from 13nm.
Q: How did Zeiss achieve this?
A: With great difficulty.
• The projection optics system is 40,000 parts and around 12 tonnes.
• The illumination system is 25,000 parts and is 6 tonnes.
• The machine that manufacturers these mirrors is based in Germany, and consists of 100,000 parts and is 150 tonnes, the machining chamber itself is a 5m x 5m x 10m vacuum chamber.
The mirrors are machined for 3 months[!] to achieve a precision equivalent to 1mm deviation over an area the size of the Pacific Ocean.
It’s worth noting here that theoretical maximum NA = 1.0
Hyper NA (>0.7 and achieved using 8 mirrors) is expected the enter production 2032 - 2035.
That brings the critical dimension down to around 6nm and that might be the end, a single silicon atom is 0.23nm so the precision would be +/- 24 atoms.
Fun note… there is a category of lathes and machine tools called “ultra-precision” and these have axis resolutions of 1-2nm and can produce contoured shapes to 25nm accuracy.
You can buy “ultra-precision” machines, grinding machines for optical equipment have incredibly precise axis control because surface asperity on a mirror is visible to the eye.
B23B is the IPC/CPC class, and it teaches some interesting niche stuff (tells you where the future is going, even with trade secrets omitted).
![Object_Zero_'s tweet photo. High NA-EUV Lithography
Zeiss is beginning production of their High NA-EUV systems for ASML.
“High NA” means high numerical aperture, which is a measure of the angular range from which an optical system can pick up light. For context High NA has numerical aperture of 0.55, whereas current EUV NA is 0.33
A 66% improvement.
That’s a feature density improvement of 1.67^2=2.789 so a near tripling of transistor density per unit area. It brings the critical dimension down to 8nm from 13nm.
Q: How did Zeiss achieve this?
A: With great difficulty.
• The projection optics system is 40,000 parts and around 12 tonnes.
• The illumination system is 25,000 parts and is 6 tonnes.
• The machine that manufacturers these mirrors is based in Germany, and consists of 100,000 parts and is 150 tonnes, the machining chamber itself is a 5m x 5m x 10m vacuum chamber.
The mirrors are machined for 3 months[!] to achieve a precision equivalent to 1mm deviation over an area the size of the Pacific Ocean.
It’s worth noting here that theoretical maximum NA = 1.0
Hyper NA (>0.7 and achieved using 8 mirrors) is expected the enter production 2032 - 2035.
That brings the critical dimension down to around 6nm and that might be the end, a single silicon atom is 0.23nm so the precision would be +/- 24 atoms.
Fun note… there is a category of lathes and machine tools called “ultra-precision” and these have axis resolutions of 1-2nm and can produce contoured shapes to 25nm accuracy.
You can buy “ultra-precision” machines, grinding machines for optical equipment have incredibly precise axis control because surface asperity on a mirror is visible to the eye.
B23B is the IPC/CPC class, and it teaches some interesting niche stuff (tells you where the future is going, even with trade secrets omitted).](https://pbs.twimg.com/media/HOjSHHdXcAE4YUy.jpg)
Some more detail on the ROIC Intelligence App I built yesterday and mentioned on today's earnings call.
I took the PDF that Brian Nowak at Morgan Stanley put together for Hyperscale ROIC this week and used Copilot code (coming in our new superapp) with a single prompt + skill (/drill-me) to create the plan, then used autopilot in auto to create the full app (with history, lookups, scenarios, what-ifs, etc). And /rubber-duck to test.
And the best part is that all the artifacts are in my enterprise environment. My app is in Copilot, my code is in GitHub Enterprise; all my data pipelines/lake/semantic models are in Fabric. And everything is under Agent 365 IT/Sec/FinOps control!
So this is not about Tokenmaxxing or vibe coding. Every step of the way the rails are engineered to create value, making everything a long-term reusable asset, with governance/security, and cost controls.
This is the full system to drive business value. Disclosures: This is all pulled from public sources, and for illustrative purposes only...not financial advice! :)
Here is the app and architecture...
The $SPY can crash under $720, $697 and even $650 in August.
Here's how to know:
Google Cloud v. Microsoft Azure
Q2 Revenue Growth:
GCP +82%
Azure +43%
$GOOGL $MSFT
Just wrapped our earnings call.
It was a very strong close to what was a record fiscal year for Microsoft.
· Annual revenue: $331B, +18%
· MS Cloud: $214B, + 27%
· And Azure: $100B, +41%
And even bigger opportunity ahead!
I wanted to share some more perspective on two areas of focus for us:
$MSFT CRUSHED THEIR Q4 EARNINGS
• Revenue $90.0B vs Est. $87.6B
• EPS $4.74 vs Est. $4.22
• Azure Revenue 43% vs. Est. 40%
• Operating Income $40.6B vs Est. $39.1B
• Commercial RPO: $678B (+84% YoY)
Azure revenue surpassed $100B for the first time.
$MSFT Microsoft Q4 FY26 (June quarter):
☁️ Azure +43% fx neutral.
• Revenue +18% Y/Y to $90.0B ($2.4B beat).
• Gross margin 67% (-1pp Y/Y)
• Operating margin 45% (flat Y/Y).
• EPS $4.74 ($0.50 beat).
So FOMC and MAGS7 earnings are on Wed.
Is this where MM wants $SPX to go?
$MSFT $META $ARM $QCOM ER At close
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